High Purity Nano Silica Sol CAS 7631-86-9 features evenly distributed nano particles and low impurity content. It delivers stable material removal rate and ultra-low surface roughness, suitable for precision polishing of sapphire substrates.

Product Detail

High Purity Nano Silica Sol CAS 7631-86-9 for Sapphire Substrate Precision Polishing

Product Overview

High Purity Nano Silica Sol (CAS 7631-86-9) is a water-based colloidal silica developed for optical substrate precision polishing. With uniformly dispersed nano silica particles and controlled low impurity level, the product maintains stable material removal rate during polishing. It helps obtain ultra-low surface roughness, reduces surface micro-defects and scratches, meeting the strict surface quality requirements of sapphire substrates for LED, optical communication and optoelectronic industries.

Core Features

High Purity & Low Impurity: Strictly control metal ion impurities, avoid surface contamination of sapphire wafers.
Uniform Nano Particle Distribution: Less large agglomerates, effectively lower scratches and surface defects.
Stable Polishing Removal Rate: Consistent processing efficiency, easy to control polishing thickness.
Excellent Dispersion Stability: No sedimentation or gelation within shelf life, convenient for continuous production.
Ultra-low Surface Roughness: Achieve high gloss and smooth surface after final polishing.
Easy Rinsing Property: Residual particles can be cleaned thoroughly, simplifying post-polishing cleaning procedure.

Product Specifications

Product Name: High Purity Nano Silica Sol

CAS No: 7631-86-9

Appearance: Translucent homogeneous liquid

Active Ingredient: Nano Silicon Dioxide

Core Function: Precision polishing, surface planarization, roughness reduction

Main Application: Sapphire substrate polishing

Applicable Fields: LED epitaxial wafers, optical window sheets, optoelectronic components

Application Scope

This high purity nano silica sol is mainly applied in precision polishing of sapphire substrates. Widely used for LED sapphire epitaxy wafers, optical sapphire windows, infrared optical components and other hard brittle optical materials. It can be matched with different polishing pads to complete rough polishing and fine polishing processes, supporting mass production of optoelectronic substrates.

Usage Guide

Stir silica sol evenly before use. Dilute with high-purity deionized water according to actual process parameters. Keep mild and continuous stirring during polishing circulation. Avoid violent high-speed agitation to prevent particle aggregation. Seal container tightly after use to prevent water evaporation and foreign impurity mixing.

Packaging & Storage

Packaging: 25kg plastic drum, IBC tank, customized clean packaging available

Storage: Store in cool, ventilated indoor environment, prevent freezing and long-time direct sunlight

Shelf Life: 6 months under sealed normal temperature storage

Our Advantages

Our high purity nano silica sol adopts precise particle size screening and purification technology with stable batch performance. Balanced performance in removal rate and surface finish, well suited for sapphire fine polishing. Adjustable solid content, particle size and pH value to satisfy different polishing processes. Factory direct supply with sufficient inventory and fast delivery. Free test samples and polishing process technical support are provided for optoelectronic material manufacturers.

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