4N high‑purity alpha alumina powder, CAS 1344‑28‑1, D50 0.1 μm, sodium content less than 2 ppm. It is produced via precise thermal calcination and multi‑step deep purification. The ultrafine alpha‑phase alumina features extremely low alkali‑metal contamination. This functional powder is applied for CMP polishing media, phosphor raw materials and CPO precision ceramic components, minimizing lattice defects and supporting high‑grade optoelectronic and semiconductor ceramic manufacturing.

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Product Detail PageHigh‑Purity Alpha Alumina Powder 4N CAS 1344‑28‑1, D50 0.1μm Na<2ppm for CMP Phosphor & CPO Precision CeramicThis 4N high‑purity alpha alumina powder is manufactured from high‑grade precursor materials through controlled high‑temperature calcination, crystal transformation, ultrafine grinding and multi‑stage purification workflows. Strict purification limits sodium content below 2 ppm. The final product exhibits stable α‑Al₂O₃ crystal phase with median particle‑size D50 controlled at 0.1 μm. Rigorous classification removes oversized coarse grains to guarantee narrow particle‑size distribution for ultrafine powder.

For CMP chemical‑mechanical polishing applications, the uniform ultrafine alumina particles provide moderate mechanical grinding action. Low‑sodium property prevents residual alkali‑ion contamination on wafer surfaces during semiconductor planarization processing, which is critical to reduce surface defects and scratches on precision wafer substrates.

When used as raw material for phosphor production, ultra‑low sodium level effectively restrains the formation of crystal lattice defects inside phosphor crystals. It improves luminous efficiency, color consistency and long‑term luminescence stability of optoelectronic phosphor powders, meeting strict quality requirements for LED and display‑related phosphor formulations.

In CPO precision ceramic manufacturing, this ultrafine high‑purity alpha alumina serves as key ceramic feedstock. Fine particle size promotes sintering activity, lowering ceramic sintering temperature and facilitating densification during firing. It helps to produce high‑dimensional‑accuracy precision ceramic parts used within advanced CPO semiconductor modules. Low alkali‑ion impurity ensures excellent electrical insulation property of sintered ceramic components, avoiding ion‑migration‑induced reliability failures under operating voltage and humidity.

The powder can undergo surface modification according to formulation requirements to improve dispersion behavior inside slurry and ceramic binder systems. Due to the ultrafine particle characteristic, the powder is prone to agglomeration under humid conditions. Hermetic sealed low‑humidity storage is mandatory. During weighing, milling and batching operations, strict segregation from regular low‑purity alumina grades must be implemented to prevent sodium‑containing cross‑contamination, which would destroy the Na＜2ppm specification. This 4N ultrafine alpha alumina powder is a premium functional raw material for CMP polishing, phosphor synthesis and CPO precision ceramic production for optoelectronic and semiconductor industries.

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High‑Purity Alpha Alumina Powder 4N CAS 1344‑28‑1, D50 0.1μm Na<2ppm for CMP Phosphor & CPO Precision Ceramic

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Jishengya Technology

Shenzhen Jishengya Technology Co., Ltd. is located in Shenzhen, a special economic zone, and is a comprehensive technology enterprise integrating independent R&D, production and sales.